Optical properties of Si nanocrystals embedded in SiO2 -: art. no. 155319

被引:35
作者
Gallas, B [1 ]
Stenger, I [1 ]
Kao, CC [1 ]
Fisson, S [1 ]
Vuye, G [1 ]
Rivory, J [1 ]
机构
[1] Univ Pierre & Marie Curie & Diderot, CNRS, Inst Nanosci Paris, F-75015 Paris, France
关键词
D O I
10.1103/PhysRevB.72.155319
中图分类号
T [工业技术];
学科分类号
08 [工学];
摘要
The dielectric function of Si nanocrystals embedded in a SiO2 matrix has been determined in the 1.6-6.2 eV spectral range without any assumption on the dispersion law. The Si nanocrystals have been obtained by thermal annealing of SiOx layers yielding nanocrystals diameters of 4.5 nm and 1 nm for atomic composition values x of 1.1 and 1.9, respectively. The dielectric function of the large Si clusters exhibited three structures located at 3.5 eV, 4.2 eV, and 5.4 eV ascribed to the E-1, E-2, and E-1(') critical points, respectively. For the smaller Si clusters, the structure associated with the E-1 CP, near 3.5 eV, disappeared while those at higher energy remained present.
引用
收藏
页数:10
相关论文
共 33 条
[1]
MODEL DIELECTRIC-CONSTANTS OF SI AND GE [J].
ADACHI, S .
PHYSICAL REVIEW B, 1988, 38 (18) :12966-12976
[2]
Ab initio calculation of excitonic effects in the optical spectra of semiconductors [J].
Albrecht, S ;
Reining, L ;
Del Sole, R ;
Onida, G .
PHYSICAL REVIEW LETTERS, 1998, 80 (20) :4510-4513
[3]
Ellipsometric study of silicon nanocrystal optical constants [J].
Amans, D ;
Callard, S ;
Gagnaire, A ;
Joseph, J ;
Ledoux, G ;
Huisken, F .
JOURNAL OF APPLIED PHYSICS, 2003, 93 (07) :4173-4179
[4]
DIELECTRIC FUNCTIONS AND OPTICAL-PARAMETERS OF SI, GE, GAP, GAAS, GASB, INP, INAS, AND INSB FROM 1.5 TO 6.0 EV [J].
ASPNES, DE ;
STUDNA, AA .
PHYSICAL REVIEW B, 1983, 27 (02) :985-1009
[5]
CARDONA M, 1969, SOLID STATE PHYSIC S, V11, P55
[6]
Spectroscopic ellipsometry analyses of sputtered Si/SiO2 nanostructures [J].
Charvet, S ;
Madelon, R ;
Gourbilleau, F ;
Rizk, R .
JOURNAL OF APPLIED PHYSICS, 1999, 85 (08) :4032-4039
[7]
Dielectric functions of Si nanocrystals embedded in a SiO2 matrix -: art. no. 153301 [J].
Chen, TP ;
Liu, Y ;
Tse, MS ;
Tan, OK ;
Ho, PF ;
Liu, KY ;
Gui, D ;
Tan, ALK .
PHYSICAL REVIEW B, 2003, 68 (15)
[8]
Ellipsometric examination of optical property of the Si-SiO2 interface using the s-wave antireflection [J].
Cho, YJ ;
Lee, YW ;
Cho, HM ;
Lee, IW ;
Kim, SY .
JOURNAL OF APPLIED PHYSICS, 1999, 85 (02) :1114-1119
[9]
Role of the interface region on the optoelectronic properties of silicon nanocrystals embedded in SiO2 -: art. no. 085327 [J].
Daldosso, N ;
Luppi, M ;
Ossicini, S ;
Degoli, E ;
Magri, R ;
Dalba, G ;
Fornasini, P ;
Grisenti, R ;
Rocca, F ;
Pavesi, L ;
Boninelli, S ;
Priolo, F ;
Spinella, C ;
Iacona, F .
PHYSICAL REVIEW B, 2003, 68 (08)
[10]
THEORETICAL ASPECTS OF THE LUMINESCENCE OF POROUS SILICON [J].
DELERUE, C ;
ALLAN, G ;
LANNOO, M .
PHYSICAL REVIEW B, 1993, 48 (15) :11024-11036