共 37 条
[1]
ELECTRON-CYCLOTRON RESONANCE MICROWAVE DISCHARGES FOR ETCHING AND THIN-FILM DEPOSITION
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1989, 7 (03)
:883-893
[2]
ELECTRON ENERGY DISTRIBUTIONS IN STATIONARY DISCHARGES
[J].
PHYSICAL REVIEW,
1954, 94 (06)
:1475-1482
[3]
BOSELL RW, 1987, APPL PHYS LETT, V50, P1130
[4]
NUMERICAL-SOLUTION OF THE SPATIALLY INHOMOGENEOUS BOLTZMANN-EQUATION AND VERIFICATION OF THE NONLOCAL APPROACH FOR ARGON PLASMA
[J].
PHYSICAL REVIEW E,
1995, 51 (01)
:280-288
[5]
TRANSFORMER COUPLED PLASMA ETCH TECHNOLOGY FOR THE FABRICATION OF SUBHALF MICRON STRUCTURES
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1993, 11 (04)
:1301-1306
[9]
GATE OXIDE DAMAGE IN A HIGH-DENSITY INDUCTIVELY-COUPLED PLASMA
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1994, 12 (01)
:454-460
[10]
Godyak V. A., 1994, Plasma Sources, Science and Technology, V3, P169, DOI 10.1088/0963-0252/3/2/007