P-type doping of Hf0.6Zr0.4NiSn half-Heusler thermoelectric materials prepared by levitation melting and spark plasma sintering

被引:3
作者
Xiao, Kai
Zhu, Tie-Jun [1 ]
Yu, Cui
Yang, Sheng-Hui
Zhao, Xin-Bing
机构
[1] Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China
关键词
FERMI-LEVEL; SUBSTITUTION; ZRNISN; GAP;
D O I
10.1557/jmr.2011.82
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The Y-doped (Hf0.6Zr0.4)(1-x)YxNiSn (x = 0, 0.01, 0.02, 0.04, 0.06, 0.1, and 0.2) half-Heusler alloys have been prepared by levitation melting and spark plasma sintering. The effect of Y doping on thermoelectric properties of the alloys was investigated in the temperature range of 300-900 K. Y-doped samples had the lower electrical conductivity compared with the parent compound without Y doping. The thermal conductivity had weak dependence on Y doping content. The absolute values of Seebeck coefficient decreased significantly when x < 0.04. The sign of Seebeck coefficient turned from negative to positive at room temperature for x = 0.04 and 0.1, which means that the hole carriers became dominant in these alloys. However, the alloys changed to n-type conduction again at high temperatures. The maximum figure of merit value of about 0.45 was obtained at 780 K for the undoped sample.
引用
收藏
页码:1913 / 1918
页数:6
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