Adsorption and dissociation of the HCl and Cl2 molecules on W(111) surface:: A computational study

被引:12
作者
Chen, Hui-Lung [2 ,3 ]
Ju, Shin-Pon [1 ]
Chen, Hsin-Tsung [4 ]
Musaev, Djamaladdin G. [2 ,3 ]
Lin, M. C. [2 ,3 ,4 ]
机构
[1] Natl Sun Yat Sen Univ, Ctr Nanosci & Nanotechnol, Dept Mech & Electromech Engn, Kaohsiung 804, Taiwan
[2] Emory Univ, Cherry L Emerson Ctr Sci Computat, Atlanta, GA 30322 USA
[3] Emory Univ, Dept Chem, Atlanta, GA 30322 USA
[4] Natl Chiao Tung Univ, Ctr Interdisciplinary Mol Sci, Inst Mol Sci, Hsinchu 300, Taiwan
关键词
D O I
10.1021/jp8002992
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The adsorption and dissociation of Cl-2 and HCl molecules on W(111) surface have been studied at the density functional theory (DFT) level in conjunction with the projector augmented wave (PAW) method. The molecular structures and surface-adsorbent interaction energies of W(111)/Cl, W(111)/H, W(111)/Cl-2, and W(111)/HCl systems are predicted. In these studies, four adsorption sites, such as top (T), bridge (B), shallow (S), and deep (D) sites, of the W(111) surface are considered. It is shown that the Cl-2 and HCl molecules adsorb to the W(111) surface by the end-on manner (by their Cl-Cl or H-Cl bonds perpendicular to the W surface), and their dissociative adsorptions occur without intrinsic energy barriers and are exothermic by 80.46 and 53.72 kcal/mol, for Cl-2 and HCl, respectively. Molecular dynamics studies show that the dissociation of Cl-2 and HCl molecules on the W(111) surface occur in asymmetric fashion: at the beginning adsorbate forms a strong bond between one of their atoms and W centers, followed by the dissociation of the Cl-Cl (and/or H-Cl) bond and formation of the second bond between the atoms of adsorbate and the W center. For the Cl-2 molecule, both Cl atoms are preferred to adsorb at the top W centers. For the HCl molecule, after the dissociation of the H-Cl bond the Cl atom still occupies the top adsorption site, but the H atom prefers to move to the position between the top and shallow W centers. The rate constants for the dissociative adsorption of Cl-2 and HCl have been predicted with variational RRKM theory.
引用
收藏
页码:12342 / 12348
页数:7
相关论文
共 35 条
[1]   Adsorption of HCl on single-crystal α-Al2O3 (0001) surface:: A DFT study [J].
Alavi, S ;
Sorescu, DC ;
Thompson, DL .
JOURNAL OF PHYSICAL CHEMISTRY B, 2003, 107 (01) :186-195
[2]   EVALUATED KINETIC AND PHOTOCHEMICAL DATA FOR ATMOSPHERIC CHEMISTRY SUPPLEMENT-IV - IUPAC SUBCOMMITTEE ON GAS KINETIC DATA EVALUATION FOR ATMOSPHERIC CHEMISTRY [J].
ATKINSON, R ;
BAULCH, DL ;
COX, RA ;
HAMPSON, RF ;
KERR, JA ;
TROE, J .
JOURNAL OF PHYSICAL AND CHEMICAL REFERENCE DATA, 1992, 21 (06) :1125-1568
[3]  
BADER RFW, 1990, ATOMS MOL A QUANTUM
[4]   PROJECTOR AUGMENTED-WAVE METHOD [J].
BLOCHL, PE .
PHYSICAL REVIEW B, 1994, 50 (24) :17953-17979
[5]   Corrosion of coating materials in oxidizing and hydrogen chloride containing atmospheres [J].
Cha, SC ;
Wölpert, P .
MATERIALS AND CORROSION-WERKSTOFFE UND KORROSION, 2002, 53 (12) :886-892
[6]   Corrosive behavior of tungsten in post dry-etch residue remover [J].
Chen, BH ;
Zhang, H ;
Chooi, SYM ;
Chan, L ;
Xu, Y ;
Ye, JH .
INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH, 2003, 42 (24) :6096-6103
[7]   Adsorption and dissociation of H2O on a w(111) surface:: A computational study [J].
Chen, Hsin-Tsung ;
Musaev, Djamaladdin G. ;
Lin, M. C. .
JOURNAL OF PHYSICAL CHEMISTRY C, 2007, 111 (46) :17333-17339
[8]   A first-principles analysis for sulfur tolerance of CeO2 in solid oxide fuel cells [J].
Chen, Hsin-Tsung ;
Choi, YongMan ;
Liu, Meilin ;
Lin, M. C. .
JOURNAL OF PHYSICAL CHEMISTRY C, 2007, 111 (29) :11117-11122
[9]   First principles study of adsorption and dissociation of CO on W(111) [J].
Chen, L ;
Sholl, DS ;
Johnson, JK .
JOURNAL OF PHYSICAL CHEMISTRY B, 2006, 110 (03) :1344-1349
[10]  
Choe SJ, 2004, B KOREAN CHEM SOC, V25, P1314