Fabrication of silicon nanowire arrays with controlled diameter, length, and density

被引：531

作者：

Huang, Zhipeng

Fang, Hui

Zhu, Jing ^{[1
]}

机构：

[1] Tsinghua Univ, Natl Ctr Electron Microscopy, Beijing 100084, Peoples R China

[2] Tsinghua Univ, Dept Mat Sci & Engn, Adv Mat Lab, Beijing 100084, Peoples R China

来源：

ADVANCED MATERIALS | 2007年 / 19卷 / 05期

关键词：

D O I：

10.1002/adma.200600892

中图分类号：

O6 [化学];

学科分类号：

0703 [化学];

摘要：

A templated catalytic etching process has been developed to fabricate large-area arrays of silicon nanowires with controlled diameter, length, and density. The figure shows an example of an array constructed by this technique. Etched polystyrene spheres are used as templates to define the lateral dimensions of the array, whereas the length of the nanowires is defined by the duration of the etching process.

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页码：744 / +

页数：6

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