The future of CMOS technology

被引：39

作者：

Isaac, RD ^{[1
]}

机构：

[1] IBM Corp, Div Res, Thomas J Watson Res Ctr, Syst Technol & Sci, Yorktown Heights, NY 10598 USA

来源：

IBM JOURNAL OF RESEARCH AND DEVELOPMENT | 2000年 / 44卷 / 03期

关键词：

Transistor scaling;

D O I：

10.1147/rd.443.0369

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

The performance of integrated circuits has been improving exponentially for more than thirty years. During the next decade, the industry must overcome several technological challenges to sustain this remarkable pace of improvement. Challenges in lithography, transistor scaling, interconnections, circuit families, computer memory, and circuit design are outlined. Possible solutions are briefly discussed. The ways in which these challenges will affect future growth in the industry are considered.

引用

页码：369 / 378

页数：10

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