Large flexible nanowire grid visible polarizer made by nanoimprint lithography

被引：68

作者：

Chen, Lei ^{[1
]}

Wang, Jian Jim ^{[1
]}

Walters, Frank ^{[1
]}

Deng, Xuegong ^{[1
]}

Buonanno, Mike ^{[1
]}

Tai, Stephen ^{[1
]}

Liu, Xiaoming ^{[1
]}

机构：

[1] NanoOpto Corp, Somerset, NJ 08873 USA

来源：

APPLIED PHYSICS LETTERS | 2007年 / 90卷 / 06期

关键词：

D O I：

10.1063/1.2472532

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

117 and 150 nm pitch polymer gratings were successfully fabricated on plastic substrate over large area by nanoimprint lithography. Nanowire-grid polarizers were made by depositing Al on the sidewalls of the gratings at oblique angles. The effects of grating period, grating linewidth, Al depth, and thickness were studied in detail. Excellent contrast (similar to 1000:1) and high transmittance (80%-90%) (without antireflection coating) at the wavelength of 500 nm and above were demonstrated. (c) 2007 American Institute of Physics.

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页数：3

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