Surface dangling-bond states and band lineups in hydrogen-terminated Si, Ge, and Ge/Si nanowires

被引:26
作者
Kagimura, R. [1 ]
Nunes, R. W. [1 ]
Chacham, H. [1 ]
机构
[1] Univ Fed Minas Gerais, ICEX, Dept Fis, BR-30123970 Belo Horizonte, MG, Brazil
关键词
D O I
10.1103/PhysRevLett.98.026801
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We report an ab initio study of the electronic properties of surface dangling-bond (SDB) states in hydrogen-terminated Si and Ge nanowires with diameters between 1 and 2 nm, Ge/Si nanowire heterostructures, and Si and Ge (111) surfaces. We find that the charge transition levels epsilon(+/-) of SDB states behave as a common energy reference among Si and Ge wires and Si/Ge heterostructures, at 4:3 +/- 0:1 eV below the vacuum level. Calculations of epsilon(+/-) for isolated atoms indicate that this nearly constant value is a periodic-table atomic property.
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页数:4
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