Nanoimprint lithography:: an alternative nanofabrication approach

被引：142

作者：

Torres, CMS

Zankovych, S

Seekamp, J

Kam, AP

Cedeño, CC

Hoffmann, T

Ahopelto, J

Reuther, F

Pfeiffer, K

Bleidiessel, G

Gruetzner, G

Maximov, MV

Heidari, B

机构：

[1] Berg Univ Wuppertal, Inst Mat Sci, Dept Elect & Informat Engn, D-42097 Wuppertal, Germany

[2] VTT Ctr Microelect, FIN-02044 Espoo, Finland

[3] Microresist Technol GmbH, D-12555 Berlin, Germany

[4] AF Ioffe Phys Tech Inst, St Petersburg 194021, Russia

[5] Obducat AB, SE-0125 Malmo, Sweden

来源：

MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS | 2003年 / 23卷 / 1-2期

关键词：

nanofabrication; nanoimprint lithography; polymer moulding;

D O I：

10.1016/S0928-4931(02)00221-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A status report of nanoimprint lithography is given in the context of alternative nanofabrication methods. Since the ultimate resolution of nanoimprint appears to be determined by the stamp, this is discussed in detail, particularly the recent developments on polymer stamps. The scope of the technique is illustrated with applications in passive optical structures and organic devices. Throughout the report, critical dimensions are discussed, as well as other challenges facing nanoimprint lithography. (C) 2002 Elsevier Science B.V All rights reserved.

引用

页码：23 / 31

页数：9

共 47 条

[1]

[Anonymous], HDB THIN FILM MATERI

[2] Fabrication of nanocontacts for molecular devices using nanoimprint lithography [J].