IrO2/Pb(Zr,Ti1-x)O-3(PZT)/Pt ferroelectric thin-film capacitors resistant to hydrogen-annealing damage

被引:32
作者
KushidaAbdelghafar, K
Miki, H
Yano, F
Fujisaki, Y
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1997年 / 36卷 / 8A期
关键词
Pb(ZrxTi1-x)O-3 ferroelectric capacitor; IrO2; electrode; hydrogen anneal; hysteresis curve;
D O I
10.1143/JJAP.36.L1032
中图分类号
O59 [应用物理学];
学科分类号
摘要
The PZT polarization hysteresis characteristics in a Pt/PZT/Pt ferroelectric capacitor are degraded by annealing in a hydrogen-containing atmosphere due to the catalytic effect of the top Pt electrode. This can be avoided by using an IrO2/PZT/Pt capacitor structure as we proposed. During hydrogen annealing of the as-grown capacitor: the top IrO2 electrode is deoxidized. degrading the capacitor characteristics. However: the polarization hysteresis characteristics are preserved after hydrogen annealing at 300 degrees C if the IrO2/PZT/Pt capacitor is pre-annealed in oxygen at 600 degrees C.
引用
收藏
页码:L1032 / L1034
页数:3
相关论文
共 8 条
[1]  
KHAMANKER R, 1994, P 1994 INT EL DEV M, P337
[2]   X-RAY PHOTOELECTRON SPECTRA OF LEAD OXIDES [J].
KIM, KS ;
OLEARY, TJ ;
WINOGRAD, N .
ANALYTICAL CHEMISTRY, 1973, 45 (13) :2214-2218
[3]   Electrode-induced degradation of Pb(ZrxTi1-x)O-3 (PZT) polarization hysteresis characteristics in Pt/PZT/Pt ferroelectric thin-film capacitors [J].
KushidaAbdelghafar, K ;
Miki, H ;
Torii, K ;
Fujisaki, Y .
APPLIED PHYSICS LETTERS, 1996, 69 (21) :3188-3190
[4]   Hydrogen-related degradation and recovery phenomena in Pb(Zr,Ti)O-3 capacitors with a platinum electrode [J].
Miki, H ;
KushidaAbdelghafar, K ;
Torii, K ;
Fujisaki, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (3A) :1132-1135
[5]  
SHIMAMOTO Y, IN PRESS APPL PHYS L
[6]   A 7.03-mu m(2) Vcc/2-plate nonvolatile DRAM cell with a Pt/PZT/Pt/TiN capacitor patterned by one-mask dry etching [J].
Shoji, K ;
Moniwa, M ;
Yamashita, H ;
Kisu, T ;
Kaga, T ;
Torii, K ;
Kumihashi, T ;
Morimoto, T ;
Kawakami, H ;
Gotoh, Y ;
Itoga, T ;
Tanaka, T ;
Yokoyama, N ;
Kure, T ;
Ohkura, M ;
Fujisaki, Y ;
Sakata, K ;
Kimura, K .
1996 SYMPOSIUM ON VLSI TECHNOLOGY: DIGEST OF TECHNICAL PAPERS, 1996, :28-29
[7]   Effect of H-2 annealing on a Pt/PbZrxTi1-xO3 interface studied by X-ray photoelectron spectroscopy [J].
Takatani, S ;
KushidaAbdelghafar, K ;
Miki, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1997, 36 (4A) :L435-L438
[8]  
Tanabe N, 1995, 1995 SYMPOSIUM ON VLSI TECHNOLOGY, P123, DOI 10.1109/VLSIT.1995.520888