Fabrication of multipassband moire resonators in fibers by the dual-phase-mask exposure method

被引：37

作者：

Everall, LA ^{[1
]}

Sugden, K ^{[1
]}

Williams, JAR ^{[1
]}

Bennion, I ^{[1
]}

Liu, X ^{[1
]}

Aitchison, JS ^{[1
]}

Thoms, S ^{[1
]}

DelaRue, KM ^{[1
]}

机构：

[1] UNIV GLASGOW,DEPT ELECT & ELECT ENGN,GLASGOW G12 8QQ,LANARK,SCOTLAND

来源：

OPTICS LETTERS | 1997年 / 22卷 / 19期

关键词：

D O I：

10.1364/OL.22.001473

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We report on the fabrication of in-fiber moire filters by dual exposure of a nondedicated chirped phase mask. This simple technique produces broadband filters whose structure depends only on an intermediate stretch between two identical UV exposures. We demonstrate moire filters with as many as four narrow passbands within a 2-nm stopband. (C) 1997 Optical Society of America.

引用

页码：1473 / 1475

页数：3

共 14 条

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