Thermal induced structural changes of a-C and a-C: Ti films analyzed by NEXAFS and XPS

被引：15

作者：

Adelhelm, C. ^{[1
]}

Balden, M. ^{[1
]}

Kost, F. ^{[1
]}

Herrmann, A. ^{[1
]}

Lindig, S. ^{[1
]}

机构：

[1] EURATOM, Max Planck Inst Plasmaphys, D-85748 Garching, Germany

来源：

PROCEEDINGS OF THE 17TH INTERNATIONAL VACUUM CONGRESS/13TH INTERNATIONAL CONFERENCE ON SURFACE SCIENCE/INTERNATIONAL CONFERENCE ON NANOSCIENCE AND TECHNOLOGY | 2008年 / 100卷

关键词：

D O I：

10.1088/1742-6596/100/6/062033

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 [材料科学与工程]; 080502 [材料学];

摘要：

Carbon K-edge NEXAFS and XPS measurements were performed on a-C and 7.5 at% a-C: Ti films annealed in-situ up to 1300 K. During annealing of a-C, the sp(2) content increased from similar to 80 to similar to 95 %, associated with the development of a peak at 285.4 eV in the NEXAFS spectrum, which is assigned to sp(2) carbon atoms in a " graphite-like" local order. After annealing of the a-C: Ti film to 470 K, an additional peak shows up, indicating the creation of carbonyl functionalities. This is explained by the increased reactivity of the carbon phase by Ti-doping. Oxygen contents of similar to 30 at% are determined by XPS up to 900 K. For a-C at temperatures >420 K, the C 1s peak width (FWHM) decreased continuously with annealing temperature, which is not the case for a-C: Ti. This is explained by oxidised carbon and by Ti diffusion during carbide crystallite formation, partly disturbing the ordering of the carbon phase.

引用

页数：4

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