Plasma-enhanced chemical vapor deposition of multiwalled carbon nanofibers

被引：37

作者：

Matthews, K ^{[1
]}

Cruden, BA ^{[1
]}

Chen, B ^{[1
]}

Meyyappan, M ^{[1
]}

Delzeit, L ^{[1
]}

机构：

[1] NASA, Ames Res Ctr, Moffett Field, CA 94035 USA

来源：

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY | 2002年 / 2卷 / 05期

关键词：

carbon nanotubes; multiwall; vertical alignment; plasma deposition; tip growth; nanodevice fabrication;

D O I：

10.1166/jnn.2002.133

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Plasma-enhanced chemical vapor deposition is used to grow vertically aligned multiwalled carbon nanofibers (MWNFs). The graphite basal planes in these nanofibers are not parallel as in nanotubes; instead they exhibit a small angle resembling a stacked cone arrangement. A parametric study with varying process parameters such as growth temperature, feedstock composition, and substrate power has been conducted, and these parameters are found to influence the growth rate, diameter, and morphology. The well-aligned MWNFs are suitable for fabricating electrode systems in sensor and device development.

引用

收藏

页码：475 / 480

页数：6

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