Electron postgrowth irradiation of platinum-containing nanostructures grown by electron-beam-induced deposition from Pt(PF3)4

被引:29
作者
Botman, A. [1 ,4 ]
Hagen, C. W. [1 ]
Li, J. [2 ]
Thiel, B. L. [2 ]
Dunn, K. A. [2 ]
Mulders, J. J. L. [3 ]
Randolph, S. [4 ]
Toth, M. [4 ]
机构
[1] Delft Univ Technol, Fac Appl Sci, NL-2628 CJ Delft, Netherlands
[2] SUNY Albany, Coll Nanoscale Sci & Engn, Albany, NY 12203 USA
[3] FEI Electron Opt, NL-5600 KA Eindhoven, Netherlands
[4] FEI Co, Hillsboro, OR 97124 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2009年 / 27卷 / 06期
关键词
crystallites; electrical resistivity; electron beam deposition; electron beam effects; grain size; nanostructured materials; platinum compounds; scanning electron microscopy; transmission electron microscopy;
D O I
10.1116/1.3253551
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
080906 [电磁信息功能材料与结构]; 082806 [农业信息与电气工程];
摘要
The material grown in a scanning electron microscope by electron beam-induced deposition (EBID) using Pt(PF3)(4) precursor is shown to be electron beam sensitive. The effects of deposition time and postgrowth electron irradiation on the microstructure and resistivity of the deposits were assessed by transmission electron microscopy, selected area diffraction, and four-point probe resistivity measurements. The microstructure, notably the platinum nanocrystallite grain size, is shown to evolve with electron fluence in a controllable manner. The resistivity was observed to decrease as a result of postgrowth electron irradiation, with the lowest observed value of 215 +/- 15 mu cm. The authors demonstrate that electron beam-induced changes in microstructure can be caused using electron fluences similar to those used during the course of EBID and suggest that the observed effects can be used to tailor the microstructure and functionality of deposits grown by EBID in situ without breaking vacuum.
引用
收藏
页码:2759 / 2763
页数:5
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