Optimized molecule supply from nozzle-based gas injection systems for focused electron- and ion-beam induced deposition and etching: simulation and experiment

被引:82
作者
Friedli, V. [1 ]
Utke, I. [1 ]
机构
[1] EMPA, Swiss Fed Labs Mat Testing & Res, Lab Mech Mat & Nanostruct, CH-3602 Thun, Switzerland
关键词
PRECURSOR MOLECULE; FLOW; PROFILES; VACUUM; TUBE;
D O I
10.1088/0022-3727/42/12/125305
中图分类号
O59 [应用物理学];
学科分类号
070305 [高分子化学与物理];
摘要
We simulated and measured near-field distributions of molecules impinging on a flat substrate from tube-based nozzles with varying exit aperture geometries (straight, bevelled and doubly perforated). Simulations were performed with the test-particle Monte Carlo approach taking into account the Knudsen number (molecular/transient flow) at the nozzle exit. Distributions were measured via thermal decomposition of Co-2(CO)(8) molecules on a homogeneously heated substrate. For all geometries and Knudsen numbers a good match between the simulation and experiment was found. For the first time the maximum accessible molecule flux with respect to the total flux exiting the nozzle could be quantified: it is around 7% for a straight cylindrical tube, around 27% for a bevelled tube and around 32% for a doubly perforated tube, all nozzles being 300 mu m distant from the substrate and having a 400 mu m aperture. Optimum substrate-nozzle angles were determined and shadow effects quantified.
引用
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页数:11
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