Phosphorus Doped Zn1-xMgxO Nanowire Arrays

被引:52
作者
Lin, S. S. [1 ]
Hong, J. I. [1 ]
Song, J. H. [1 ]
Zhu, Y. [2 ]
He, H. P. [2 ]
Xu, Z. [2 ]
Wei, Y. G. [1 ]
Ding, Y. [1 ]
Snyder, R. L. [1 ]
Wang, Z. L. [1 ]
机构
[1] Georgia Inst Technol, Sch Mat Sci & Engn, Atlanta, GA 30332 USA
[2] Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Zhejiang, Peoples R China
关键词
THIN-FILMS; ZNO; EPITAXY; GROWTH;
D O I
10.1021/nl902067a
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We demonstrate the growth of phosphorus doped Zn1-xMgxO nanowire (NW) using pulsed laser deposition. For the first time, p-type Zn0.92Mg0.08O:P NWs are likely obtained In reference to atomic force microscopy based piezoelectric output measurements, X-ray photoelectron spectroscopy, and the transport property between the NWs and a n-type ZnO film. A shallow acceptor level of similar to 140 meV is identified by temperature-dependent photoluminescence. A piezoelectric output of 60 mV on average has been received using the doped NWs. Besides a control on NW aspect ratio and density, band gap engineering has also been achieved by alloying with Mg to a content of x = 0.23. The alloyed NWs with controllable conductivity type have potential application in high-efficiency all-ZnO NWs based LED, high-output ZnO nanogenerator, and other optical or electrical devices.
引用
收藏
页码:3877 / 3882
页数:6
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