Metrology of pulsed radiation for 157-nm lithography

被引：35

作者：

Richter, M

Kroth, U

Gottwald, A

Gerth, C

Tiedtke, K

Saito, T

Tassy, I

Vogler, K

机构：

[1] Phys Tech Bundesanstalt, D-10587 Berlin, Germany

[2] DESY, D-22603 Hamburg, Germany

[3] Natl Metrol Inst Japan, Tsukuba, Ibaraki 3058563, Japan

[4] Lambda Phys AG, D-37079 Gottingen, Germany

来源：

APPLIED OPTICS | 2002年 / 41卷 / 34期

关键词：

D O I：

10.1364/AO.41.007167

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

In the framework of current developments in 157-nm lithography we have investigated the performance of photodetectors with emphasis to their stability and linearity. The measurements were performed in the radiometry laboratories of the Physikalisch-Technische Bundesanstalt at the Berlin electron-storage rings BESSY I and BESSY II with spectrally dispersed synchrotron radiation as well as with highly pulsed F-2 laser radiation at 157 nm in combination with a. cryogenic radiometer as the primary detector standard. Relative standard uncertainties of as little as 1% were achieved for the calibration of photodetectors in the spectral range of ultraviolet and vacuum-ultraviolet radiation. (C) 2002 Optic Society of America.

引用

页码：7167 / 7172

页数：6

共 16 条

[1] Absolute silicon photodiodes for 160 nm to 254 nm photons [J].