Palladium island growth on Ni(111) - Stochastic classical trajectory - Ghost atom calculations

被引：7

作者：

Brault, P

deAlmeida, J

机构：

[1] Grp. Rech. l'Energetique Milieux I., URA 831 CNRS, Université d'Orléans, F-45067 Orleans Cedex 2

来源：

SURFACE SCIENCE | 1996年 / 360卷 / 1-3期

关键词：

adatoms; adsorption kinetics; atomistic dynamics; atom-solid interactions; scattering; diffraction; catalysis; clusters; computer simulations; construction and use of effective interatomic interactions; epitaxy; growth; low index single crystal surfaces; models of surface kinetics; molecular dynamics; nickel; nucleation; palladium; physical adsorption; single crystal epitaxy; solid-gas interfaces; sticking; surface diffusion;

D O I：

10.1016/0039-6028(96)00644-9

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We generalize previous stochastic classical trajectory-ghost atom calculations for describing palladium deposition onto the Ni(lll) surface between 0.1 and 0.5 monolayers. The growth evolves through two-dimensional islands. The islands are formed following the downward funneling mechanism. Surface temperature does not affect the island growth.

引用

页码：43 / 49

页数：7

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