Thermal annealing effects on stimulated emission of high-indium-content InGaN/GaN single quantum well structure

被引:5
作者
Chen, CC [1 ]
Hsieh, KL
Chi, GC
Chuo, CC
Chyi, JI
Chang, CA
机构
[1] Natl Cent Univ, Dept Phys, Chungli 32054, Taiwan
[2] Natl Cent Univ, Dept Elect Engn, Chungli 32054, Taiwan
[3] Ind Technol Res Inst, Optoelect & Syst Labs, Hsinchu 310, Taiwan
关键词
GaN; quantum well; thermal annealing; intersubband transition; interdiffusion; piezoelectric field;
D O I
10.1016/S0038-1101(02)00053-9
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The optical pumping spectra of InGaN/GaN single quantum well structures with high indium content after thermal annealing were analyzed at room temperature. Redshift of the peak position in the optical pumping spectra was observed after the samples were annealed for 0.5 h at 700 degreesC. However, blueshift of the peak position was shown after the samples were annealed for 1 and for 2 h. Three mechanisms of band structure deformation due to the thermal treatments have been proposed. The redshift of the peaks might be due to the reduction of the inhomogeneity of the indium content in quantum well. The blueshift of the peaks might originate from the strain relaxation resulting in the reduction of the piezoelectric field or/and the interfacial interdiffusion of In and Ga atoms between the well and barrier. (C) 2002 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:1123 / 1126
页数:4
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