Effect of thermal annealing on high indium content InGaN/GaN single quantum well structures

被引:26
作者
Chen, CC [1 ]
Hsieh, KL
Chi, GC
Chuo, CC
Chyi, JI
Chang, CA
机构
[1] Natl Cent Univ, Dept Phys, Chungli 32054, Taiwan
[2] Natl Cent Univ, Dept Elect Engn, Chungli 32054, Taiwan
[3] Ind Technol Res Inst, Optoelect & Syst Labs, Hsinchu 310, Taiwan
关键词
D O I
10.1063/1.1363678
中图分类号
O59 [应用物理学];
学科分类号
摘要
Photoluminescence measurement in surface-emitting geometry, optical pumping in edge-emitting geometry and spatially resolved spectra measurement were performed to study high-indium-content InxGa1-xN/GaN single quantum well (SQW) structures (x greater than or equal to 32%) grown by low-pressure metalorganic chemical vapor deposition. Stimulated-emission (SE) was observed in the optical pumping spectra. Thermal annealing was performed to investigate the influence of high temperature treatment to the optical properties of the samples. Redshift of the SE peaks took place after the samples were annealed at 700 degreesC for 30 and 60 min. Blue shift of these SE peaks was observed after the samples were annealed for 120 min. Red shift of the SE peaks may be attributed to the reduction of the compositional fluctuation in quantum well (QW) leading to the decrease of the quantized energies. The interdiffusion of In and Ga atoms across the interface of barrier and QW can result in the increase or decrease of the quantized energies leading to the redshift or blueshift of the SE peaks. The relaxation of the strain in the QW by annealing can induce the blueshift of the SE peaks. (C) 2001 American Institute of Physics.
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页码:5465 / 5468
页数:4
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