Determination of refractive-index profiles by a combination of visible and infrared ellipsometry measurements

被引：7

作者：

Van, VN ^{[1
]}

BrunetBruneau, A ^{[1
]}

Fisson, S ^{[1
]}

Frigerio, JM ^{[1
]}

Vuye, G ^{[1
]}

Wang, Y ^{[1
]}

Abeles, F ^{[1
]}

Rivory, J ^{[1
]}

Berger, M ^{[1
]}

Chaton, P ^{[1
]}

机构：

[1] CEA,LAB ELECT TECHNOL INSTRUMENTAT,COUCHES MINCES OPT,F-38054 GRENOBLE,FRANCE

来源：

APPLIED OPTICS | 1996年 / 35卷 / 28期

关键词：

ellipsometry; index gradients; optical thin films; silicon oxynitrides;

D O I：

10.1364/AO.35.005540

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Model inhomogeneous silicon oxynitride films were produced by ion-beam sputtering and characterized by ellipsometry in the visible and infrared ranges. These films exhibit strong intentional gradients of the refractive index that cannot be considered linear. A discrete description of the index profile with a few layers or a continuous description with a polynomial are examined; regressions by the use of measurements in the visible only or in the total spectral range (visible and infrared) are performed. Acquisition of data in an extended range is found to be a guarantee of the reliability of the calculated index profiles. (C) 1996 Optical Society of America

引用

页码：5540 / 5544

页数：5

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