Surface-state electrical conductivity at a metal-insulator transition on silicon

被引:139
作者
Tanikawa, T [1 ]
Matsuda, I [1 ]
Kanagawa, T [1 ]
Hasegawa, S [1 ]
机构
[1] Univ Tokyo, Sch Sci, Dept Phys, Bunkyo Ku, Tokyo 1130033, Japan
基金
日本学术振兴会;
关键词
D O I
10.1103/PhysRevLett.93.016801
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
A quasi-one-dimensional metallic Si(111)-(4x1)-In surface was investigated by a newly developed temperature-variable microscopic four-point probe method combined with in situ electron diffraction in ultrahigh vacuum. We have succeeded, for the first time, in detecting directly a surface metal-insulator transition around 130 K as a dramatic change of electrical conductivity through the surface states. An energy gap of similar to300 meV at the low-temperature phase, influences of defects and phase locking between the neighboring charge-density-wave chains were elucidated from the temperature dependence of conductivity.
引用
收藏
页码:016801 / 1
页数:4
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