Local structure of ion-bombarded alpha-SiC analyzed by EXAFS

被引:1
作者
Borowski, M
Bolse, W
Conrad, J
机构
[1] UNIV GOTTINGEN,INST PHYS 2,D-37073 GOTTINGEN,GERMANY
[2] UNIV GOTTINGEN,SFB 345,D-37073 GOTTINGEN,GERMANY
来源
JOURNAL DE PHYSIQUE IV | 1997年 / 7卷 / C2期
关键词
D O I
10.1051/jp4:1997215
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
X-ray absorption spectroscopy on the Si k-edge was performed on alpha-SiC (6H) to monitor the evolution of the local structure around the Si atoms after ion bombardment. The samples were irradiated by 50 keV Na ions at fluences of 10(13) - 10(16) ions/cm(2) at 8 temperature of 80 K. EXAFS analysis clearly reveals that the hetero-atomic short range order of the crystalline matrix is almost completely conserved over the crystalline-to-amorphous transition as indicated by RBS-C. Further irradiation at higher fluences results in a change of the atomic coordination and formation of homonuclear Si-Si bonds.
引用
收藏
页码:711 / 712
页数:2
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