Comment on "Near-Edge X-Ray Absorption Fine-Structure Investigation of Graphene"

被引:61
作者
Jeong, H. -K. [1 ]
Noh, H. -J. [2 ]
Kim, J. -Y. [3 ,4 ]
Colakerol, L. [5 ]
Glans, P. -A. [6 ]
Jin, M. H. [1 ]
Smith, K. E. [5 ]
Lee, Y. H. [1 ]
机构
[1] Sungkyunkwan Adv Inst Nanotechnol, Ctr Nanotubes & Nanostructured Composites, Dept Energy Sci, Dept Phys, Suwon 440746, South Korea
[2] Chonnam Natl Univ, Dept Phys, Kwangju 500757, South Korea
[3] POSTECH, Pohang Accelerator Lab, Pohang 790784, South Korea
[4] POSTECH, Dept Phys, Pohang 790784, South Korea
[5] Boston Univ, Dept Phys, Boston, MA 02215 USA
[6] Univ Calif Berkeley, Lawrence Berkeley Lab, Adv Light Source, Berkeley, CA 94720 USA
关键词
GRAPHITE OXIDES;
D O I
10.1103/PhysRevLett.102.099701
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
A Comment on the Letter by D. Pacile et al., Phys. Rev. Lett. 101, 066806 (2008). The authors of the Letter offer a Reply.
引用
收藏
页数:1
相关论文
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