Silica buried channel waveguides fabricated at low temperature using PECVD

被引：11

作者：

Durandet, A

Perry, A

Boswell, R

Ladouceur, F

Love, J

Faith, M

Kemeny, P

Ma, X

Austin, M

机构：

[1] AUSTRALIAN NATL UNIV,CTR OPT SCI,CANBERRA,ACT 0200,AUSTRALIA

[2] ROYAL MELBOURNE INST TECHNOL,DEPT COMMUN & ELECT ENGN,MELBOURNE,VIC 3001,AUSTRALIA

[3] TELECOM AUSTRALIA,RES LAB,CLAYTON,VIC 3168,AUSTRALIA

来源：

ELECTRONICS LETTERS | 1996年 / 32卷 / 04期

关键词：

optical waveguides; plasma deposition;

D O I：

10.1049/el:19960254

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Buried channel waveguides made of silica films deposited on silicon substrates have been fabricated at low temperature ( < 100 degrees C) without thermal annealing, using the Helicon plasma deposition technique. The guides have losses as low as 1 dB/cm. A 1 x 8 splitter comprising concatenated Y-junctions has been fabricated and characterised.

引用

页码：326 / 327

页数：2

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