Determination of the Al mole fraction and the band gap bowing of epitaxial AlxGa1-xN films

被引:285
作者
Angerer, H
Brunner, D
Freudenberg, F
Ambacher, O
Stutzmann, M
Hopler, R
Metzger, T
Born, E
Dollinger, G
Bergmaier, A
Karsch, S
Korner, HJ
机构
[1] TECH UNIV MUNICH, LEHRSTUHL ANGEW MINERAL & GEOCHEM, D-85748 GARCHING, GERMANY
[2] TECH UNIV MUNICH, PHYS DEPT E12, D-85748 GARCHING, GERMANY
关键词
D O I
10.1063/1.119949
中图分类号
O59 [应用物理学];
学科分类号
摘要
AlxGa1-xN alloys were grown on c-plane sapphire by plasma-induced molecular beam epitaxy. The Al content x was varied over the whole composition range (0 less than or equal to x less than or equal to 1). The molar Al fraction was deduced from x-ray diffraction and for comparison by elastic recoil detection analysis. The composition of the alloys calculated from the lattice parameter c underestimates x. This is due to a deformation of the unit cell. The exact Al mole fraction and the biaxial strain of the alloys can be calculated by an additional determination of alpha, using asymmetric reflections. The results obtained by x-ray diffraction and elastic recoil detection provide evidence for the validity of Vegard's law in the AlGaN system. In addition, the deviation of the band gap from a linear dependence on x was investigated. We found a downward bowing with a bowing parameter b=1.3 eV. (C) 1997 American Institute of Physics.
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页码:1504 / 1506
页数:3
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