Three-dimensional micro- and nanostructuring by combination of nanoimprint and x-ray lithography

被引：8

作者：

Tormen, M ^{[1
]}

Romanato, F ^{[1
]}

Altissimo, M ^{[1
]}

Businaro, L ^{[1
]}

Candeloro, P ^{[1
]}

Di Fabrizio, EM ^{[1
]}

机构：

[1] INFM, TASC, Lilit Beamline SS, I-34012 Trieste, Italy

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2004年 / 22卷 / 02期

关键词：

D O I：

10.1116/1.1688356

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We present results on a lithographic approach that combines nanoimprint(NIL) and x-ray lithography (XRL) for fabricating unconventional three-dimensional (3D) polymer structures. The use of XRL for structuring a prepatterned resist by NIL gives rise to high-resolution high-aspect-ratio structures whose overall profile is enveloped by the original 3D imprinted profile. The technological potential of this method has been demonstrated by patterning several different types of structures with XRL on an hexagonal affay of hemispheres previously obtained by nanoimprinting. (C) 2004 American Vacuum Society.

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页码：766 / 770

页数：5

相关论文

共 19 条

[1] X-ray lithography fabrication of a zone plate for X-rays in the range from 15 to 30 keV [J].

Altissimo, M ;

Romanato, F ;

Vaccari, L ;

Businaro, L ;

Cojoc, D ;

Kaulich, B ;

Cabrini, S ;

Di Fabrizio, E .

MICROELECTRONIC ENGINEERING, 2002, 61-2 :173-177

[2] Fabrication of topologically complex three-dimensional microfluidic systems in PDMS by rapid prototyping [J].

Anderson, JR ;

Chiu, DT ;

Jackman, RJ ;

Cherniavskaya, O ;

McDonald, JC ;

Wu, HK ;

Whitesides, SH ;

Whitesides, GM .

ANALYTICAL CHEMISTRY, 2000, 72 (14) :3158-3164

[3] High-resolution complex structures for two-dimensional photonic crystals realized by x-ray diffraction lithography [J].

Businaro, L ;

Romanato, F ;

Candeloro, P ;

Di Fabrizio, E ;

Patrini, M ;

Galli, M ;

Andreani, C ;

Passaseo, A ;

De Vittorio, M .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (02) :748-753

[4] Nanoelectromechanical systems [J].

Craighead, HG .

SCIENCE, 2000, 290 (5496) :1532-1535

[5]

CUISIN C, 2003, MICROELECTRON ENG, V67, P679

[6] High-efficiency multilevel zone plates for keV X-rays [J].

Di Fabrizio, E ;

Romanato, F ;

Gentili, M ;

Cabrini, S ;

Kaulich, B ;

Susini, J ;

Barrett, R .

NATURE, 1999, 401 (6756) :895-898

[7] Design of a beamline for soft and deep lithography on third generation synchrotron radiation source [J].

Di Fabrizio, E ;

Nucara, A ;

Gentili, M ;

Cingolani, R .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1999, 70 (03) :1605-1613

[8] HIGH-EFFICIENCY CONTINUOUS SURFACE-RELIEF GRATINGS FOR 2-DIMENSIONAL ARRAY GENERATION [J].

EHBETS, P ;

HERZIG, HP ;

PRONGUE, D ;

GALE, MT .

OPTICS LETTERS, 1992, 17 (13) :908-910

[9] UPDATED SYSTEM MODEL FOR X-RAY-LITHOGRAPHY [J].

KHAN, M ;

MOHAMMAD, L ;

XIAO, J ;

OCOLA, L ;

CERRINA, F .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (06) :3930-3935

[10] Bioanalysis in microfluidic devices [J].

Khandurina, J ;

Guttman, A .

JOURNAL OF CHROMATOGRAPHY A, 2002, 943 (02) :159-183