Leveling and rebuilding:: An approach to improve the uniformity of (In,Ga)As quantum dots

被引:16
作者
Gong, Q [1 ]
Nötzel, R [1 ]
Hamhuis, GJ [1 ]
Eijkemans, TJ [1 ]
Wolter, JH [1 ]
机构
[1] Eindhoven Univ Technol, COBRA Interuniv Res Inst, NL-5600 MB Eindhoven, Netherlands
关键词
D O I
10.1063/1.1506780
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on an approach to improve the uniformity of a single layer of (In,Ga)As quantum dots (QDs) grown by molecular-beam epitaxy. The key concept of our approach is to level and rebuild the (In,Ga)As QDs during insertion of a short period GaAs/InAs superlattice between the (In,Ga)As QD layer and the GaAs capping layer. For optimized layer thickness and number of superlattice periods this process results in uniform (In,Ga)As QDs with narrow photoluminescence line width of 20 meV at 4.5 K. (C) 2002 American Institute of Physics.
引用
收藏
页码:1887 / 1889
页数:3
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