Modulated electron emission by scattering-interference of primary electrons

被引:46
作者
Valeri, S [1 ]
diBona, A [1 ]
机构
[1] UNIV MODENA,DIPARTIMENTO FIS,I-41100 MODENA,ITALY
关键词
D O I
10.1142/S0218625X9700016X
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We review the effects of scattering-interference of the primary, exciting beam on the electron emission from ordered atomic arrays. The yield of elastically and inelastically backscattered electrons, Auger electrons and secondary electrons shows a marked dependence on the incidence angle of primary electrons. Both the similarity and the relative importance of processes experienced by incident and excident electrons are discussed. We also present recent studies of electron focusing and defocusing along atomic chains. The interplay between these two processes determines the in-depth profile of the primary electron intensity anisotropy. Finally, the potential for surface-structural studies and limits for quantitative analysis are discussed, in comparison with the Anger electron diffraction (AED) and photoelectron diffraction (PD) techniques.
引用
收藏
页码:141 / 160
页数:20
相关论文
共 63 条
[1]   MATERIAL DEPENDENCE OF MULTIPLE-SCATTERING EFFECTS ASSOCIATED WITH PHOTOELECTRON AND AUGER-ELECTRON DIFFRACTION ALONG ATOMIC CHAINS [J].
AEBISCHER, HA ;
GREBER, T ;
OSTERWALDER, J ;
KADUWELA, AP ;
FRIEDMAN, DJ ;
HERMAN, GS ;
FADLEY, CS .
SURFACE SCIENCE, 1990, 239 (03) :261-264
[2]   EVALUATION AND MEASUREMENT OF CHANGES IN INTENSITY OF THE CHARACTERISTIC LINES AND BACKGROUND OF AUGER-ELECTRON SPECTRA DUE TO CRYSTALLINE EFFECTS - APPLICATION TO AN ALUMINUM TARGET BOMBARDED WITH ELECTRONS [J].
AKAMATSU, B ;
HENOC, P ;
MAURICE, F ;
LEGRESSUS, C ;
RAOUADI, K ;
SEKINE, T ;
SAKAI, T .
SURFACE AND INTERFACE ANALYSIS, 1990, 15 (01) :7-14
[3]   XPS STOICHIOMETRY MEASUREMENTS ON SURFACES OF III-V CRYSTALLINE COMPOUNDS [J].
ALNOT, P ;
OLIVIER, J ;
FADLEY, CS .
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1989, 49 (02) :159-173
[4]  
ARMITAGE AF, 1980, SURF SCI, V100, pL483, DOI 10.1016/0039-6028(80)90410-0
[5]   MEASUREMENTS OF THE MAGNITUDE OF CRYSTALLINE EFFECTS IN AUGER-ELECTRON SPECTROSCOPY [J].
BISHOP, HE .
SURFACE AND INTERFACE ANALYSIS, 1990, 15 (01) :27-37
[6]  
BISHOP HE, 1984, ELECT BEAM INTERACTI, P236
[7]  
BRIGGS D, 1990, PRACTICAL SURFACE AN, V1
[8]   ELASTIC STRAIN AT PSEUDOMORPHIC SEMICONDUCTOR HETEROJUNCTIONS STUDIED BY X-RAY PHOTOELECTRON DIFFRACTION - GE/SI(001) AND SI/GE(001) [J].
CHAMBERS, SA ;
LOEBS, VA .
PHYSICAL REVIEW B, 1990, 42 (08) :5109-5116
[9]   ELASTIC-SCATTERING AND INTERFERENCE OF BACKSCATTERED PRIMARY, AUGER AND X-RAY PHOTOELECTRONS AT HIGH KINETIC-ENERGY - PRINCIPLES AND APPLICATIONS [J].
CHAMBERS, SA .
SURFACE SCIENCE REPORTS, 1992, 16 (06) :261-331
[10]   AUGER-ELECTRON SPECTROSCOPY AS A REAL-TIME COMPOSITIONAL PROBE IN MOLECULAR-BEAM EPITAXY [J].
CHAMBERS, SA ;
TRAN, TT ;
HILEMAN, TA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (01) :83-91