Investigations on magnetron sputtered ZnO thin films and Au/ZnO Schottky diodes

被引:40
作者
Dhananjay [1 ]
Nagaraja, J.
Krupanidhi, S. B.
机构
[1] Indian Inst Sci, Dept Instrumentat, Bangalore 560012, Karnataka, India
[2] Indian Inst Sci, Mat Res Ctr, Bangalore 560012, Karnataka, India
关键词
Schottky diodes; barrier height; space charge limited current;
D O I
10.1016/j.physb.2006.10.017
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 [凝聚态物理];
摘要
Magnetron sputtering is a promising technique for the growth of oxide materials including ZnO, which allows deposition of films at low temperatures with good electrical properties. The current-voltage (I-P) characteristics of An Schottky contacts on magnetron sputtered ZnO, films have been measured over a temperature range of 278-358K. Both effective barrier height (phi(B,eff)) and ideality factor (n) are found to be a function of temperature, and this behavior has been interpreted on the basis of a Gaussian distribution of barrier heights due to barrier height inhomogeneities that prevail at the interface. Density of states (DOS) near the Fermi level is determined using a model based on the space charge limited current (SCLC). The dispersion in both real and imaginary parts of the dielectric constant at low frequencies, with increase in temperature is attributed to the space charge effect. Complex impedance plots exhibited two semicircles, which corresponds to bulk grains and the grain boundaries. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:344 / 349
页数:6
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