Production of inductively coupled RF plasma using a ladder-shaped antenna

被引：16

作者：

Murata, M ^{[1
]}

Mashima, H ^{[1
]}

Yoshioka, M ^{[1
]}

Nishida, S ^{[1
]}

Morita, S ^{[1
]}

Kawai, Y ^{[1
]}

机构：

[1] MITSUBISHI HEAVY IND CO LTD,NAGASAKI RES & DEV CTR,NAGASAKI 85103,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1997年 / 36卷 / 7B期

关键词：

inductively coupled plasma; ladder-shaped antenna; plasma CVD; a-Si:H films; high discharge frequency;

D O I：

10.1143/JJAP.36.4563

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A radio-frequency (RF) excited Hz plasma is produced using a ladder-shaped antenna which is positioned within a plasma chamber and the fundamental characteristics of the plasma are examined. The potential and current fed to the antenna are almost in phase. The plasma parameters are measured as a function of RF power, gas pressure and gas flow rate with a Langmuir probe. It is found that the plasma density is uniform within +/-10% over 300 mm. Furthermore, increases in the frequency of the RF power source lead to increases in the plasma density. When a mesh grid is installed between the antenna and the substrate, the plasma density and the plasma potential decrease.

引用

页码：4563 / 4567

页数：5

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