Photoluminescence and Raman studies of electrochemically as-grown and annealed ZnO films

被引:50
作者
Yang, Yingling
Yan, Hongwei
Fu, Zhengping
Yang, Beifang [1 ]
Xia, Linsheng
Xu, Yuandong
Zuo, Jian
Li, Fanqing
机构
[1] Univ Sci & Technol China, Dept Mat Sci & Engn, Hefei 230026, Anhui, Peoples R China
[2] Univ Sci & Technol China, Struct Res Lab, Hefei 230026, Anhui, Peoples R China
关键词
ZnO; defect; annealing; electrodeposition; photoluminescence;
D O I
10.1016/j.ssc.2006.04.024
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The photoluminescence (PL) properties of ZnO films fabricated by electrodeposition were investigated by using annealing treatment at various temperatures and in different atmospheres. The PL spectra are composed of a dominant UV emission and a weak green emission at room temperature. Our experimental reveals that the optimum annealing condition for UV emission exists at 400 degrees C in N-2 atmosphere. A correlation between the UV PL intensity and Raman scattering intensity is first observed below 500 degrees C both in N-2 and O-2 atmosphere under resonant excitation. We suggest the 575 cm(-1) Raman peak is strongly affected by a non-radiative center, and the intense UV emission of ZnO annealed at 400 degrees C in N-2 atmosphere is due to the reduction of this center. Two different green emission bands are observed, which show different dependences of the PL intensity on the annealing temperature. According to the defect levels in the ZnO films and the analysis of the intensity dependences on annealing temperature and atmospheres, we suggest they are caused by interstitial oxygen (O-i) and antisite oxygen (O-Zn), respectively. (c) 2006 Elsevier Ltd. All rights reserved.
引用
收藏
页码:521 / 525
页数:5
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