The interface screening model as origin of imprint in PbZrxTi1-xO3 thin films.: I.: Dopant, illumination, and bias dependence

被引:216
作者
Grossmann, M [1 ]
Lohse, O
Bolten, D
Boettger, U
Schneller, T
Waser, R
机构
[1] Rhein Westfal TH Aachen, Inst Werkstoffe Elektrotech, D-52056 Aachen, Germany
[2] Forschungszentrum Julich, Inst Festkorperforsch, D-52425 Julich, Germany
关键词
D O I
10.1063/1.1498966
中图分类号
O59 [应用物理学];
学科分类号
摘要
Comprehensive imprint measurements on PbZrxTi1-xO3 (PZT) thin films were carried out. Different models, which were proposed in literature to explain imprint in ferroelectric thin films or a similar aging effect (internal bias) in ferroelectric bulk material, are reviewed. Discrepancies between the experimental results obtained on the PZT films in this work and the prediction of the literature models indicate that these models do not describe the dominant imprint mechanism in PZT thin films. Hence, in this work a model is proposed which suggests imprint to be caused by a strong electric field within a thin surface layer in which the ferroelectric polarization is smaller or even absent compared to the bulk of the film. With the proposed imprint model the influence of important experimental parameters like dopant, illumination, and bias dependence can be qualitatively explained. (C) 2002 American Institute of Physics.
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页码:2680 / 2687
页数:8
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