Current transient analysis of the oxidizing process in the complete anodic regime of the Si-HF system

被引:22
作者
Hasse, G [1 ]
Carstensen, J [1 ]
Popkirov, G [1 ]
Föll, H [1 ]
机构
[1] Univ Kiel, Fac Engn, D-24143 Kiel, Germany
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 2000年 / 69卷
关键词
silicon; electrochemistry; I-V-characteristics; transient measurements; kinetics; oxidation;
D O I
10.1016/S0921-5107(99)00259-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Potential step experiments from anodic potential to open circuit potential in the electrochemical system Si-HF result in a transient current peaks. provided that oxide was present at the electrode surface. The current transients can be analyzed quantitatively and provide information about the anodic oxide and the electrode processes. ttl this paper it is shown that the complete I-V-characteristics (including the region of porous silicon layer (PSL) formation) is governed by the oxidation process, that the points of inflection (and not the maxima) indicate changes in electrode processes, and that several linear relations between electrode processes and external parameters can be obtained from evaluating the experiments. The findings are consistent with the view that the electrode processes can be seen as results of the interaction of current bursts which may be synchronized by stochastic processes in time and space and indicate in addition that simple, albeit not yet fully understood mechanisms cause the amazing multitude of phenomena occurring at the Si-liquid interface. (C) 2000 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:188 / 193
页数:6
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