Metrics for performance benchmarking of nanoscale Si and carbon nanotube FETs including device nonidealities

被引:22
作者
Deng, J [1 ]
Wong, HSP
机构
[1] Stanford Univ, Ctr Integrated Syst, Stanford, CA 94305 USA
[2] Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA
基金
美国国家科学基金会;
关键词
carbon nanotube FET (CNFET); CMOS; effective drive current; modeling; nanoscale;
D O I
10.1109/TED.2006.874159
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper proposes a simple and accurate expression for inverter effective drive current for nanoscale Si and carbon nanotube FET (CNFET) performance benchmarking. The choice of I-eff = (I-NL + I-NM + I-NH - I-P)/3, where I-NL = IDS(N-FET) (V-GS = 0.5V(DD), V-DS = V-DD), I-NM = IDS(N-FET)(V-GS = 0.75V(DD), V-DS = 0.75V(DD)), I-NH = IDS(N-FET) (V-GS V-DD, V-DS = 0.5V(DD)), and I-P = ISD(P-FET) (V-SG 0.25V(DD), V-SD = 0.25V(DD)), includes the effects of both the nFET and the pFET of an inverter and accurately captures the inverter delay performance over many CMOS technology nodes and in the presence of device nonidealities. The proposed metric indicates that the performance enhancement of CNFETs over Si MOSFETs is not as large as that predicted by I-Dsat at in a circuit environment because of the nonideal I-V characteristics.
引用
收藏
页码:1317 / 1322
页数:6
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