Effects of multilevel phase masks on interpixel cross talk in digital holographic storage

被引:32
作者
Bernal, MP
Burr, GW
Coufal, H
Grygier, RK
Hoffnagle, JA
Jefferson, CM
Oesterschulze, E
Shelby, RM
Sincerbox, GT
Quintanilla, M
机构
[1] UNIV KASSEL,PHYS TECH INST,D-34132 KASSEL,GERMANY
[2] UNIV ZARAGOZA,FAC CIENCIAS,DEPT FIS APLICADA,E-50009 ZARAGOZA,SPAIN
来源
APPLIED OPTICS | 1997年 / 36卷 / 14期
关键词
holographic storage; interpixel cross talk; phase masks;
D O I
10.1364/AO.36.003107
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We study the interpixel cross talk introduced to digital holographic data storage by use of a multilevel phase mask at the data-input plane. We evaluate numerically the intensity distribution at the output detector for Fourier plane hologram storage in a limited-aperture storage medium. Only the effect at an output pixel of interpixel cross talk from the four horizontal and vertical neighboring pixels is considered, permitting systematic evaluation of all possibilities. For random two-level and pseudorandom six-level phase masks, the influence of the pixel fill factor, as well as the aperture size of the storage medium, is studied. Our simulations show that, for a given aperture size, a random two-level mask is more susceptible to interpixel cross talk than is a pseudorandom six-level mask. Decreasing the pixel fill factor below 94% with a pseudorandom six-level phase mask makes it theoretically possible to have a system with no errors from interpixel cross talk if one particular 5-pixel pattern is forbidden through modulation coding. Reducing the input fill factor below 85% means that no patterns need to be excluded. (C) 1997 Optical Society of America.
引用
收藏
页码:3107 / 3115
页数:9
相关论文
共 16 条
[11]   ANGLE-MULTIPLEXED STORAGE OF 5000 HOLOGRAMS IN LITHIUM-NIOBATE [J].
MOK, FH .
OPTICS LETTERS, 1993, 18 (11) :915-917
[12]   DIFFUSER WITH PSEUDORANDOM PHASE SEQUENCE [J].
NAKAYAMA, Y ;
KATO, M .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1979, 69 (10) :1367-1372
[13]  
SINCERBOX G, 1994, CURRENT TRENDS OPTIC, P195
[14]   RANDOM PHASE DATA MASKS - FABRICATION TOLERANCES AND ADVANTAGES OF 4 PHASE LEVEL MASKS [J].
STEWART, WC ;
FOX, EC ;
FIRESTER, AH .
APPLIED OPTICS, 1972, 11 (03) :604-&
[15]   THEORY OF OPTICAL INFORMATION STORAGE IN SOLIDS [J].
VANHEERDEN, PJ .
APPLIED OPTICS, 1963, 2 (04) :393-400
[16]   STATISTICAL-ANALYSIS OF CROSS-TALK NOISE AND STORAGE CAPACITY IN VOLUME HOLOGRAPHIC MEMORY [J].
YI, XM ;
YEH, PC ;
GU, C .
OPTICS LETTERS, 1994, 19 (19) :1580-1582