Thermodynamic aspects of the GaN deposition from the gaseous phase

被引:10
作者
Leitner, J
Stejskal, J
Vonka, P
机构
[1] INST CHEM TECHNOL, DEPT INORGAN CHEM, PRAGUE 16628 6, CZECH REPUBLIC
[2] INST CHEM TECHNOL, DEPT PHYS CHEM, PRAGUE 16628 6, CZECH REPUBLIC
关键词
gallium nitride; VPE; MOCVD; thermodynamic properties; equilibrium calculations;
D O I
10.1016/0167-577X(96)00057-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
On the basis of the thorough thermodynamic analysis feasible conditions for the deposition of GaN epitaxial layers in the hydride and metalorganic systems were determined. The optimized thermodynamic data for solid GaN were used for the equilibrium calculations. Good agreement between the calculated and experimental results was achieved.
引用
收藏
页码:197 / 201
页数:5
相关论文
共 37 条
[31]   GROWTH OF SINGLE-CRYSTAL GAN SUBSTRATE USING HYDRIDE VAPOR-PHASE EPITAXY [J].
NANIWAE, K ;
ITOH, S ;
AMANO, H ;
ITOH, K ;
HIRAMATSU, K ;
AKASAKI, I .
JOURNAL OF CRYSTAL GROWTH, 1990, 99 (1-4) :381-384
[32]   GAN, AIN, AND INN - A REVIEW [J].
STRITE, S ;
MORKOC, H .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (04) :1237-1266
[33]   EQUILIBRIUM PRESSURE OF N2 OVER GAN [J].
THURMOND, CD ;
LOGAN, RA .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (05) :622-&
[34]   EQUILIBRIUM GAS-PHASE SPECIES FOR MOCVD OF ALXGA1-XAS [J].
TIRTOWIDJOJO, M ;
POLLARD, R .
JOURNAL OF CRYSTAL GROWTH, 1986, 77 (1-3) :200-209
[35]   CALCULATION OF CHEMICAL-EQUILIBRIA IN HETEROGENEOUS MULTICOMPONENT SYSTEMS [J].
VONKA, P ;
LEITNER, J .
CALPHAD-COMPUTER COUPLING OF PHASE DIAGRAMS AND THERMOCHEMISTRY, 1995, 19 (01) :25-36
[36]  
Wagman D.D., 1982, J PHYS CHEM REF D S2, V11
[37]   GROWTH OF EPITAXIAL LAYERS OF GALLIUM NITRIDE ON SILICON CARBIDE AND CORUNDUM SUBSTRATES [J].
WICKENDEN, DK ;
FAULKNER, KR ;
BRANDER, RW ;
ISHERWOO.J .
JOURNAL OF CRYSTAL GROWTH, 1971, 9 (01) :158-+