Stability of Si-interstitial defects: From point to extended defects

被引:87
作者
Kim, J
Kirchhoff, F
Wilkins, JW
Khan, FS
机构
[1] Ohio State Univ, Dept Phys, Columbus, OH 43210 USA
[2] Ohio State Univ, Dept Elect Engn, Columbus, OH 43210 USA
关键词
D O I
10.1103/PhysRevLett.84.503
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Trends in the growth of extended interstitial defects are extracted from extensive tight-binding and ab inito local density approximation simulations. With an increasing number of interstitials, the stable defect shape evolves from compact to chainlike to rodlike. The rodlike {311} defect, formed from (011) interstitial chains, is stabilized as it grows, elongating in the chain direction. Accurate parametrization of the defect-formation energy on the number of interstitials and interstitial chains, together with the anisotropy of the interstitial capture radius. enables macroscopic defect-growth simulations.PACS numbers: 61.72.Cc, 61.72.Ji, 71.55.-i.
引用
收藏
页码:503 / 506
页数:4
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