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Ion etching of Ag(110) studied by X-ray and STM

被引：4
作者：
Boragno, C
de Mongeot, FB
Costantini, G
Valbusa, U
Felici, R
Smilgies, DM
Ferrer, S
机构：
[1] INFM, UdR Genova, I-16146 Genoa, Italy
[2] Dipartimento Fis, I-16146 Genoa, Italy
[3] ESRF, INFM, OGG, F-38043 Grenoble, France
[4] Cornell Univ, CHESS, Ithaca, NY 14853 USA
[5] ESRF, F-38043 Grenoble, France
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2002年 / 193卷
关键词：
D O I：
10.1016/S0168-583X(02)00858-3
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
The evolution of the morphology of ion sputtered Ag(110) has been Studied by X-ray technique at the European Synchrotron Radiation in Grenoble and by scanning tunneling microscope. The surface was bombarded with Ar+. ions at an energy of 1 keV, changing the temperature in the range 100-320 K. The erosion is never layer by layer in the explored temperature range. On the contrary, regular structures (ripples) can be created on the surface, and their orientation rotates by 90degrees by changing temperature. Also the slope of the mounds/ripples changes with temperature, ranging between 6degrees and 12degrees if measured along <1-10> and between 8degrees and 10degrees along <001>. (C) 2002 published by Elsevier Science B.V.
引用
收藏
页码：590 / 595
页数：6
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