Barrier inhomogeneities and electrical characteristics of Ti/4H-SiC Schottky rectifiers

被引:138
作者
Defives, D
Noblanc, O
Dua, C
Brylinski, C
Barthula, M
Aubry-Fortuna, V
Meyer, F
机构
[1] Thomson CSF, Cent Rech Lab, F-91404 Orsay, France
[2] Univ Paris Sud, CNRS URA 0022, Inst Elect Fondamentale, F-91405 Orsay, France
关键词
barrier inhomogeneities; Schottky barrier rectifiers; silicon carbide;
D O I
10.1109/16.748861
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Forward density-voltage (J-V) measurements of titanium/4H-SiC Schottky rectifiers are presented in a large temperature range, While some of the devices present a behavior in accordance with the thermionic current theory, others present an excess forward current at low voltage level. This anomaly appears more or less depending on the rectifier and on the temperature, A model based on tno parallel Schottky rectifiers with different barrier heights is presented, The whole characteristics are fitted with good agreement, It is shown that the excess current at low voltage can be explained by a lowering of the Schottky barrier in localized regions, A proposal for the physical origin of these low barrier height areas is given.
引用
收藏
页码:449 / 455
页数:7
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