A probe of intrinsic valence band electronic structure: Hard x-ray photoemission

被引:87
作者
Takata, Y [1 ]
Tamasaku, K
Tokushima, T
Miwa, D
Shin, S
Ishikawa, T
Yabashi, M
Kobayashi, K
Kim, JJ
Yao, T
Yamamoto, T
Arita, M
Namatame, H
Taniguchi, M
机构
[1] RIKEN SPring 8, 1-1-1 Kouto, Mikazuki, Hyogo 6795148, Japan
[2] JASRISPring8, Mikazuki, Hyogo 6795198, Japan
[3] Tohoku Univ, Interdisciplinary Res Ctr, Sendai, Miyagi 9808578, Japan
[4] Kochi Univ Technol, Tosayamada, Kochi 7828502, Japan
[5] Hiroshima Univ, HiSOR, Higashihiroshima 7398526, Japan
[6] Univ Tokyo, ISSP, Chiba 2778581, Japan
关键词
D O I
10.1063/1.1756209
中图分类号
O59 [应用物理学];
学科分类号
摘要
Hard x-ray valence band photoemission spectroscopy (PES) is realized using high-energy and high-brilliance synchrotron radiation. High-energy (similar to6 keV) excitation results in larger probing depths of photoelectrons compared to conventional PES, and enables a study of intrinsic electronic property of materials in actual device structures much less influenced by surface condition. With this technique, requirements for surface preparation are greatly reduced, if not eliminated. It is a nondestructive tool to determine electronic structure from surface to genuine bulk as shown by a study on SiO2/Si(100). Electronic structure modification related to the ferromagnetism in the diluted magnetic semiconductor Ga0.96Mn0.04N is also observed. (C) 2004 American Institute of Physics.
引用
收藏
页码:4310 / 4312
页数:3
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