Inductive plasmas for plasma processing

被引:149
作者
Keller, JH
机构
[1] IBM Microelectronic Div., Bldg. 630-EL1, Hopewell Jct.
关键词
Electric impedance - Plasma density - Plasma etching - Skin effect;
D O I
10.1088/0963-0252/5/2/008
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
With the need for high plasma density and low pressure in single wafer etching tools, a number of inductive etching systems have been and are being developed for commercial sale. This paper reviews some of the history of low-pressure inductive plasmas, gives features of inductive plasmas, limitations, corrections and presents uses for plasma processing. The theory for the skin depth, rf coil impedance and efficiency is also discussed.
引用
收藏
页码:166 / 172
页数:7
相关论文
共 40 条
[1]  
BOBBIO SM, 1990, P SOC PHOTO-OPT INS, V1185, P262, DOI 10.1117/12.978065
[2]   MULTIPOLE CONFINED DIFFUSION PLASMA PRODUCED BY 13.56 MHZ ELECTRODELESS SOURCE [J].
BOSWELL, RW ;
PERRY, AJ ;
EMAMI, M .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (06) :3345-3350
[3]  
BOSWELL RW, 1991, COMMUNICATION
[4]  
CATER JB, 1993, J VAC SCI TECHNOL A, V11, P1301
[5]  
CHEN CH, 1993, Patent No. 5226967
[6]  
COULTAS DK, 1994, Patent No. 5304279
[7]  
COULTAS DK, 1989, Patent No. 0379828
[8]  
DAVIS MH, 1989, Patent No. 2231197
[9]   2-DIMENSIONAL SELF-CONSISTENT FLUID SIMULATION OF RADIO-FREQUENCY INDUCTIVE SOURCES [J].
DIPESO, G ;
VAHEDI, V ;
HEWETT, DW ;
ROGNLIEN, TD .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1994, 12 (04) :1387-1396
[10]   DOPPLER-SHIFT MEASUREMENTS OF ION ENERGY-DISTRIBUTION WIDTHS IN AN ELECTRON-CYCLOTRON RESONANCE MULTIPOLE HYBRID REACTOR [J].
FORSTER, J ;
KLEPPER, CC ;
BERRY, LA ;
GORBATKIN, SM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (05) :3114-3118