Influence of molybdenum on the formation of C54TiSi2:: Template phenomenon versus grain-size effect

被引：25

作者：

Zhang, SL

d'Heurle, FM

机构：

[1] Kungliga Tekn Hgsk, Dept Elect, SE-16440 Kista, Sweden

[2] IBM Corp, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA

来源：

APPLIED PHYSICS LETTERS | 2000年 / 76卷 / 14期

关键词：

D O I：

10.1063/1.126180

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Experimental results are presented for the formation of TiSi2 in the presence of an ultrathin Mo layer deposited either at the interface between Ti and Si or on top of Ti/Si. The formation of C54 TiSi2 is clearly shown to be enhanced with a surface Mo layer, although the effect is less pronounced as compared to the use of an interposed Mo layer. The results can be accounted for with a template mechanism where the formation of C40 (Mo, Ti)Si-2 is crucial for the epitaxial growth of C54 TiSi2 atop. Possible grain-size effects on the formation of C54 TiSi2 are also discussed. (C) 2000 American Institute of Physics. [S0003-6951(00)01914-8].

引用

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页码：1831 / 1833

页数：3

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