Halide CVD of Bi2O3 under atmospheric pressure:: Synthesis of α-rods and δ-films

被引：4

作者：

Takeyama, Tomoharu

Kajikawa, Yuya

Takahashi, Naoyuki

Nakamura, Takato

Itoh, Setsuro

机构：

[1] Shizuoka Univ, Grad Sch Sci & Technol, Hamamatsu, Shizuoka 4328561, Japan

[2] Univ Tokyo, Sch Engn, Inst Engn Innovat, Bunkyo Ku, Tokyo 1138656, Japan

[3] Shizuoka Univ, Fac Engn, Dept Mat Sci & Technol, Hamamatsu, Shizuoka 4328561, Japan

[4] Asahi Glass Co Ltd, Res Ctr, Yokohama, Kanagawa 2218755, Japan

来源：

CHEMICAL VAPOR DEPOSITION | 2006年 / 12卷 / 04期

关键词：

D O I：

10.1002/cvde.200504215

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

[No abstract available]

引用

页码：203 / 206

页数：4

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