Deposition of SiOx films from O2/HMDSO plasmas

被引：95

作者：

Hegemann, D

Vohrer, U

Oehr, C

Riedel, R

机构：

[1] Fraunhofer Inst Grenzflachen & Bioverfahrenstech, D-70563 Stuttgart, Germany

[2] Tech Univ Darmstadt, Fachbereich Mat Wissensch, Fachgebiet Disperse Feststoffe, D-64287 Darmstadt, Germany

来源：

SURFACE & COATINGS TECHNOLOGY | 1999年 / 116卷

关键词：

adhesion; r.f; plasma; SiOx films;

D O I：

10.1016/S0257-8972(99)00092-4

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The variation of O-2/HMDSO ratio in an r.f. plasma was carried out to optimize SiOx film properties and deposition rates for the coating of polymers. A ratio exceeding 6:1 yields scratch resistant, quartz-like films with low carbon contents. The chemical composition was analyzed to SiO1.8C0.3 by XPS. A compact plasma reactor was developed generating homogeneous plasmas and depositions over large areas (up to 380 x 290 mm(2)). Furthermore, the total coverage of three-dimensional formed parts was managed with good adhesion of SiOx films to polymers like PC and PBT to reduce wear. (C) 1999 Elsevier Science S.A. All rights reserved.

引用

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页码：1033 / 1036

页数：4

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