Preparation of anatase and rutile thin films by controlling oxygen partial pressure

被引：91

作者：

Syarif, DG ^{[1
]}

Miyashita, A ^{[1
]}

Yamaki, T ^{[1
]}

Sumita, T ^{[1
]}

Choi, Y ^{[1
]}

Itoh, H ^{[1
]}

机构：

[1] Japan Atom Energy Res Inst, Dept Mat Dev, Takasaki, Gumma 3701292, Japan

来源：

APPLIED SURFACE SCIENCE | 2002年 / 193卷 / 1-4期

关键词：

titanium dioxide; photocatalytic activity; atomic force microscope; pulsed laser ablation;

D O I：

10.1016/S0169-4332(02)00532-9

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Titanium dioxide (TiO2) films on glass substrates were prepared by pulsed laser deposition (PLD) technique. The dependence of crystal structure, morphology and photocatalytic activity on oxygen partial pressure were investigated using X-ray diffraction (XRD), atomic force microscope (AFM) and UV-VIS spectrophotometer. By increasing oxygen partial pressure, the surface morphology changed from smooth to rough, and the crystal structure changed from rutile to anatase at fixed substrate temperature of 773 K. The change of the surface morphology and the formation of anatase structure by variation of oxygen partial pressure resulted in an increase of photocatalytic activity. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：287 / 292

页数：6

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