Characterization of hydrogen-free diamond-like carbon films deposited by pulsed plasma technology

被引：33

作者：

Wang, DY ^{[1
]}

Chang, CL

Ho, WY

机构：

[1] Natl Chung Hsing Univ, Inst Mat Engn, Taichung 40227, Taiwan

[2] Surftech Corp, Taichung, Taiwan

来源：

THIN SOLID FILMS | 1999年 / 355卷

关键词：

diamond-like carbon; graphite; adhesion; pulsed bias;

D O I：

10.1016/S0040-6090(99)00513-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Diamond-like carbon (DLC) films demonstrated significant advantages in cutting and forming non-ferrous materials. The ultra-low friction coefficient and high surface hardness make DLC one of the most promising surface modification technologies available for processing advanced structural materials. In this study, Ti-doped and hydrogen-free DLC films (a-C:Ti) were synthesized by unbalanced magnetron sputtering of Ti and graphite targets. The high residual stress of the DLC thin films was dissipated through a compound interface ;consisting of a series of Ti, TiN, and TiC(x)N(y) graded interlayers. The target poisoning problem was resolved with a 2 kHz medium-frequency DC power supply. In addition, a 20-100 kHz variable frequency DC power supply was used for both are suppressing and substrate biasing. The effects of deposition parameters on film qualities were investigated by SEM/EDS, XRD, EELS and wear tests. Results demonstrated an improved DLC thin film with superior microhardness and adhesion strength compared with the conventional DLC deposited by PVD or PECVD processes. (C) 1999 Elsevier Science S.A. All rights reserved.

引用

页码：246 / 251

页数：6

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