Molecular beam epitaxial growth of ZnMgO/ZnO/ZnMgO single quantum well structure on Si(111) substrate

被引:10
作者
Fujita, Miki
Suzuki, Ryotaro
Sasajima, Masanori
Kosaka, Tomohiro
Deesirapipat, Yuparwadee
Horikoshi, Yoshiji
机构
[1] Waseda Univ, Sch Sci & Engn, Shinjuku Ku, Tokyo 1698555, Japan
[2] Waseda Univ, Kagami Mem Lab Mat Sci & Technol, Shinjuku Ku, Tokyo 1690051, Japan
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2006年 / 24卷 / 03期
基金
日本学术振兴会;
关键词
D O I
10.1116/1.2200381
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We grow Zn1-xMgxO/ZnO/Zn1-xMgxO single quantum well structures on Si(111) substrates by using ZnO/MgO buffer layers. MgO buffer layer on Si substrate is essential to the crack-free ZnO epitaxial growth. On the other hand, ZnO buffer layer on MgO buffer layer guarantees the hexagonal ZnMgO layer on it. The two different Mg fractions, 0.12 and 0.32, are used for Zn1-xMgxO barrier layers. The photoluminescence measurement at 10 K using He-Cd laser shows clear emission lines from the single quantum wells. Their peak energies increase with decreasing the quantum well width and coincide quite well with the simulation based on the previously reported parameters. These results show that good quality Zn1-xMgxO/ZnO/Zn1-xMgxO single quantum well structures have been grown on Si(111) substrates. (c) 2006 American Vacuum Society.
引用
收藏
页码:1668 / 1670
页数:3
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