Crack-free and conductive Si-doped AlN/GaN distributed Bragg reflectors grown on 6H-SiC(0001)

被引:42
作者
Ive, T [1 ]
Brandt, O [1 ]
Kostial, H [1 ]
Hesjedal, T [1 ]
Ramsteiner, M [1 ]
Ploog, KH [1 ]
机构
[1] Paul Drude Inst Festkorperelekt, D-10117 Berlin, Germany
关键词
D O I
10.1063/1.1791738
中图分类号
O59 [应用物理学];
学科分类号
摘要
We demonstrate Si-doped n-type AlN/GaN distributed Bragg reflectors grown on 6H-SiC(0001). The structures are crack-free and have a stopband centered around 450 nm with a full width at half maximum between 40 and 50 nm. The maximum measured reflectance is greater than or equal to99%. A comparison between Si-doped and undoped structures reveals no degradation of the reflectance due to the Si doping. Vertical conductance measurements at room temperature on the samples show an ohmic I-V behavior in the entire measurement range. The measured resistivity at 77 K is only a factor of 2 larger than the resistivity measured at room temperature. (C) 2004 American Institute of Physics.
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页码:1970 / 1972
页数:3
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