Change of conduction mechanism by microstructural variation in Pt/(Ba,Sr)TiO3/Pt film capacitors

被引:39
作者
Ahn, KH [1 ]
Kim, SS
Baik, S
机构
[1] Pohang Univ Sci & Technol, Dept Mat Sci & Engn, Pohang 790784, South Korea
[2] Sunchon Natl Univ, Dept Mat Sci & Met Engn, Sunchon 540742, South Korea
[3] Pohang Univ Sci & Technol, Dept Mat Sci & Engn, Pohang 790784, South Korea
关键词
D O I
10.1063/1.1484233
中图分类号
O59 [应用物理学];
学科分类号
摘要
The effects of microstructure on the leakage current behaviors in Pt/(Ba,Sr)TiO3/Pt thin film capacitors prepared by a radio-frequency magnetron sputtering technique were studied. Both applying an epitaxial seed layer and controlling post-annealing processes enabled us to obtain (Ba,Sr)TiO3 films of three different microstructures (granular, columnar, and epitaxial) but possessing an identical interface state with the Pt electrode. The Schottky emission dominates in the film composed of granular grains. In contrast, the Fowler-Nordheim tunneling governs in the epitaxial film with much elevated leakage current levels. In the case of the columnar film, at low temperatures the tunneling dominates, while at high temperatures the Schottky emission governs with intermediate leakage levels. An energy band model accounting for the change of leakage current mechanisms by microstructure variation is presented. (C) 2002 American Institute of Physics.
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收藏
页码:421 / 425
页数:5
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